1. Reita, C., "Integrated driver circuits for active matrix liquid crystal displays", Displays, Vol. 14, No. 2, (1993), 104-114.
2. Brotherton, S., "Polycrystalline silicon thin film transistors", Semiconductor Science and Technology, Vol. 10, No. 6, (1995), 721-738.
3. Edwards, M., "Nmos and cmos polysilicon drive circuits for liquid crystal displays", IEE Proceedings-Circuits, Devices and Systems, Vol. 141, No. 1, (1994), 50-55.
4. Robertson, J., "Electronic structure of silicon nitride", Philosophical Magazine B, Vol. 63, No. 1, (1991), 47-77.
5. Vaezi, M. and Zameni, M., "Synthesis of zinc oxide nanostructured thin film by sol-gel method and evaluation of gas sensing properties", International Journal of Engineering-Transactions B: Applications, Vol. 27, No. 5, (2013), 757-762.
6. Nikzad, L., Vaezi, M., Alibeigi, S. and Esmaielzadeh, K.A., "Preparation of cobalt oxide/zinc oxide nanocomposite", International Journal of Engineering-Transactions B: Applications, Vol. 27, No. 5, (2010), 131-135,
7. Khalili, V., Khalil, A.J. and Maleki, G.H., "Titanium oxide (tio2) coatings on niti shape memory substrate using electrophoretic deposition process", International Journal of Engineering-Transactions A: Basics, Vol. 26, No. 7, (2013), 707-712.
8. Hossein, B.F. and Orvatinia, M., "Thickness dependence of sensitivity in thin film tin oxide gas sensors deposited by vapor pyrolysis", International Journal of Engineering-Transactions B: Applications, Vol. 16, No. 1, (2003), 33-40.
9. Ohwada, J.-I., Takabatake, M., Ono, Y.A., Nagae, Y., Mimura, A., Ono, K. and Konishi, N., "Peripheral circuit integrated poly-si tft lcd with gray scale representation", in Display Research Conference, 1988., Conference Record of the 1988 International, IEEE. (1988), 215-219.
10. Kim, J., Hwang, S. and Yi, J., "Sio 2 films deposited at low temperature by using apcvd with teos/o 3 for tft applications", Journal of the Korean Physical Society, Vol. 49, No. 3, (2006), 1121-1125.
11. Maeda, M. and Nakamura, H., "Deposition kinetics of sio2 film", Journal of Applied Physics, Vol. 52, No. 11, (1981), 6651-6654.
12. Padmanabhan, K. and Prabhu, G., "Experimental investigation by cryogenic treatment of aluminium 6063 and 8011 and nicow coating to improve hardness and wear", International Journal of Engineering-Transactions C: Aspects, Vol. 29, No. 6, (2016), 827-833.
13. Golbakhshi, H., Namjoo, M. and Estabragh, E.R., "Evaluating the effects of ceramic layer and thermal dam on optimizing the temperature gradient of a gasoline engine piston", International Journal of Engineering-Transactions A: Basics, Vol. 28, No. 10, (2015), 1525-1532.
14. Azadia, M., Rouhaghdam, A.S. and Ahangarani, S., "Effect of temperature and gas flux on the mechanical behavior of tic coating by pulsed dc plasma enhanced chemical vapor deposition", International Journal of Engineering-Transactions B: Applications, Vol. 27, No. 8, (2013), 1243-1250.
15. Akhondizadeh, M., FOOLADI, M.M., Mansouri, S. and Rezaeizadeh, M., "A new procedure of impact wear evaluation of mill liner", International Journal of Engineering-Transactions A: Basics, Vol. 28, No. 4, (2015), 593-598.
16. Hattangady, S., Alley, R., Fountain, G., Markunas, R., Lucovsky, G. and Temple, D., "Effect of rf power on remote‐plasma deposited sio2 films", Journal of Applied Physics, Vol. 73, No. 11, (1993), 7635-7642.
17. Batey, J. and Tierney, E., "Low‐temperature deposition of high‐quality silicon dioxide by plasma‐enhanced chemical vapor deposition", Journal of Applied Physics, Vol. 60, No. 9, (1986), 3136-3145.
18. Riera, M., Rodriguez, J., Barreto, J. and Domínguez, C., "Modeling of non-stoichiometric silicon oxides obtained by plasma enhanced chemical vapour deposition process", Thin Solid Films, Vol. 515, No. 7-8, (2007), 3380-3386.